(Al,In,Ga,B)N device structures on a patterned substrate
US8183557B2 · kind B2 · utility
11Cited by
3References
27Claims
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Key dates
| Filing date | Sep 19, 2008 |
| Grant date | May 22, 2012 |
| Priority date | — |
| Expiry date | May 13, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/825
Abstract
A nitride light emitting diode, on a patterned substrate, comprising a nitride interlayer having at least two periods of alternating layers of InxGa1−xN and InyGa1−yN where 0<x<1 and 0≦y<1, and a nitride based active region having at least one quantum well structure on the nitride interlayer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.