Patent · US Active

Anchoring inserts, electrode assemblies, and plasma processing chambers

US8187414B2 · kind B2 · utility

9Cited by
48References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 2009
Grant dateMay 29, 2012
Priority date
Expiry dateFeb 7, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/032
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A silicon-based showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a threaded outside diameter, a threaded inside diameter, and a tool engaging portion formed in the threaded inside diameter. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque receiving slots.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.