Cleaning method by electrolytic sulfuric acid and manufacturing method of semiconductor device
US8187449B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Jun 26, 2009 |
| Grant date | May 29, 2012 |
| Priority date | — |
| Expiry date | Dec 3, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/46
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The cleaning method by electrolytic sulfuric acid and the manufacturing method of semiconductor device comprising:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.