Large area roll-to-roll imprint lithography
US8187515B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 31, 2009 |
| Grant date | May 29, 2012 |
| Priority date | — |
| Expiry date | Oct 11, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.