Patent · US Active

Large area roll-to-roll imprint lithography

US8187515B2 · kind B2 · utility

3Cited by
22References
14Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 31, 2009
Grant dateMay 29, 2012
Priority date
Expiry dateOct 11, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y40/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.