Thermally isolated cryopanel for vacuum deposition systems
US8192547B2 · kind B2 · utility
3Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2007 |
| Grant date | Jun 5, 2012 |
| Priority date | — |
| Expiry date | Mar 13, 2031 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF04B37/08
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
The present invention relates to vacuum depositions systems and related deposition methods. Vacuum deposition systems that use one or more cyropanels for localized pumping of a deposition region where a substrate is positioned are provided. The present invention is particularly applicable to pumping and minimizing reevaporation of high vapor pressure deposition materials during molecular beam epitaxy.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.