Method for manufacturing multiple layers of waveguides
US8192638B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 2008 |
| Grant date | Jun 5, 2012 |
| Priority date | — |
| Expiry date | Aug 24, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing multiple layers of waveguides is disclosed. Initially, a first cladding layer is deposited on a substrate, a first inner cladding layer is then deposited on the first cladding layer, and a first waveguide material is deposited on the first inner cladding layer. The first inner cladding layer and the first waveguide material are then selectively etched to form a first waveguide layer. Next, a second inner cladding layer followed by a second cladding layer are deposited on the first waveguide layer. The second inner cladding layer and the second cladding layer are removed by using a chemical-mechanical polishing process selective to the first waveguide material. A third inner cladding layer followed by a second waveguide material are deposited on the first waveguide material. The third inner cladding layer and the second waveguide material are then selectively etched to form a second waveguide layer. Finally, a fourth inner cladding layer followed by a third cladding layer are deposited on the second waveguide layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.