Method for operating a dual beam chromatic point sensor system for simultaneously measuring two surface regions
US8194251B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2010 |
| Grant date | Jun 5, 2012 |
| Priority date | — |
| Expiry date | Nov 15, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method provide a dual beam chromatic point sensor (CPS) system operable to simultaneously measure two surface regions. In one embodiment, a single beam CPS optical pen may have a dual beam assembly attached. First and second measurement beams of the system may be positioned on respective first and second surface regions, and both reflect light through a confocal aperture of the dual beam CPS. At least one set of measurements is determined, comprising a first and second measurement arising from the first and second measurement beams, respectively. At least the first surface region may be moved to acquire sets of measurements at various positions. Each measurement may be determined with extremely fine resolution (e.g., at least as fine as 10 nm). The system and method satisfy applications that require such resolution and accuracy without the use of an interferometer or other costly and complex elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.