Vapor deposition systems and methods
US8202575B2 · kind B2 · utility
367Cited by
37References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 2005 |
| Grant date | Jun 19, 2012 |
| Priority date | — |
| Expiry date | Jun 27, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2258/0216
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Vapor deposition systems and methods associated with the same are provided. The systems may be designed to include features that can promote high quality deposition; simplify manufacture, modification and use; as well as, reduce the footprint of the system, amongst other advantages.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.