Jill S. Becker
14Patents
4h-index
9Co-inventors
49Inventor score
Filing activity: Sep 28, 2001 → May 23, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8202575B2 | Vapor deposition systems and methods | Performing Operations; Transporting | 367 | Expired |
| US6969539B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Electricity | 54 | Expired |
| US7560581B2 | Vapor deposition of tungsten nitride | Electricity | 15 | Expired |
| US7507848B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Electricity | 9 | Active |
| US8008743B2 | Vapor deposition of silicon dioxide nanolaminates | Chemistry; Metallurgy | 4 | Active |
| US9777371B2 | ALD systems and methods | Chemistry; Metallurgy | 3 | Active |
| US9567670B2 | Method for high-velocity and atmospheric-pressure atomic layer deposition with substrate and coating head separation distance in the millimeter range | Chemistry; Metallurgy | 2 | Active |
| US8334016B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Electricity | 1 | Active |
| US9905414B2 | Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Electricity | 1 | Active |
| US9783888B2 | Atomic layer deposition head | Chemistry; Metallurgy | 1 | Active |
| US9556519B2 | Vapor deposition systems and methods | Performing Operations; Transporting | 0 | Active |
| US9328417B2 | System and method for thin film deposition | Chemistry; Metallurgy | 0 | Active |
| US8536070B2 | Vapor deposition of silicon dioxide nanolaminates | Chemistry; Metallurgy | 0 | Active |
| US9175388B2 | Reaction chamber with removable liner | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.