Stitching of near-nulled subaperture measurements
US8203719B2 · kind B2 · utility
1Cited by
5References
30Claims
0Family size
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Key dates
| Filing date | Apr 8, 2009 |
| Grant date | Jun 19, 2012 |
| Priority date | — |
| Expiry date | Aug 2, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0257
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A metrology system for measuring aspheric test objects by subaperture stitching. A wavefront-measuring gauge having a limited capture range of wavefront shapes collects partially overlapping subaperture measurements over the test object. A variable optical aberrator reshapes the measurement wavefront with between a limited number of the measurements to maintain the measurement wavefront within the capture range of the wavefront-measuring gauge. Various error compensators are incorporated into a stitching operation to manage residual errors associated with the use of the variable optical aberrator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.