Resist composition, method of forming resist pattern, compound and acid generator
US8206890B2 · kind B2 · utility
1Cited by
7References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 8, 2009 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Apr 8, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.