High flux photon beams using optic devices
US8208602B2 · kind B2 · utility
27Cited by
6References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2010 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Oct 2, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A system for producing at least one high flux photon beam is provided. The system includes two or more photon sources configured to produce photon beams, and at least one first stage optic device coupled to at least one of the photon sources and providing at least one focused photon beam through total internal reflection, wherein at least one of the photon beams and the focused photon beams are combined at a virtual focal spot.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.