Polymer, polymer preparation method, resist composition and patterning process
US8216766B2 · kind B2 · utility
0Cited by
4References
14Claims
0Family size
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Key dates
| Filing date | Mar 25, 2009 |
| Grant date | Jul 10, 2012 |
| Priority date | — |
| Expiry date | May 10, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymer having a rate of dissolution in an alkaline developer that increases under the action of acid is provided. The polymer is prepared by reacting a hydrogenated ROMP polymer with an O-alkylating agent in the presence of a base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.