Multi-column electron beam exposure apparatus and multi-column electron beam exposure method
US8222619B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2009 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Jul 5, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24542
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-column electron beam exposure apparatus includes: a plurality of column cells; a wafer stage including an electron-beam-property detecting unit for measuring an electron beam property; and a controller for measuring beam properties of electron beams used in all the column cells by using the electron-beam-property detecting unit, and for adjusting the electron beams of the respective column cells so that the properties of the electron beams used in the column cells may be approximately identical. The electron beam property may be any of a beam position, a beam intensity, and a beam shape of the electron beam to be emitted. The electron-beam-property detecting unit may be a chip for calibration with a reference mark formed thereon or a Faraday cup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.