Method and apparatus for advanced process control
US8224475B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 13, 2009 |
| Grant date | Jul 17, 2012 |
| Priority date | — |
| Expiry date | Aug 17, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method includes: initializing first and second variables; operating equipment based on the variables; measuring first and second parameters; determining a new value for the first variable based on the first parameter, and calculating a new value for the second variable based on the second parameter and the current value of the second variable; and repeating the operating, measuring, determining and calculating. According to a different aspect, an apparatus includes a computer-readable medium storing a computer program. When executed, the program causes: initializing of first and second variables; operating equipment based on the variables; receiving measured first and second parameters; determining a new value for the first variable based on the first parameter, and calculating a new value for the second variable based on the second parameter and the current value of the second variable; and repeating the operating, measuring, determining and calculating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.