Patent · US Active

Debris prevention system and lithographic apparatus

US8227771B2 · kind B2 · utility

3Cited by

34References

20Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Wouter Anthon Soer · Nijmegen, NL
Maarten Marinus Johannes Wilhelmus Van Herpen · Heesch, NL

Key dates

Filing date	Jul 23, 2007
Grant date	Jul 24, 2012
Priority date	—
Expiry date	Apr 3, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70916
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.