Crystal growth apparatus and method
US8231727B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 17, 2008 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Jan 29, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1068
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Systems and methods are disclosed for crystal growth using VGF and VB growth processes to reduce body lineage. In one exemplary embodiment, there is provided a method of inserting an ampoule with raw material into a furnace having a heating source, growing a crystal using a vertical gradient freeze process wherein the crystallizing temperature gradient is moved relative to the crystal and/or furnace to melt the raw material and reform it as a monocrystalline compound, and growing the crystal using a vertical Bridgman process on the wherein the ampoule/heating source are moved relative each other to continue to melt the raw material and reform it as a monocrystalline compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.