Patent · US Active

Compensated isolated p-well DENMOS devices

US8232158B2 · kind B2 · utility

5Cited by
0References
9Claims
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Assignee

Inventors

Key dates

Filing dateJun 28, 2010
Grant dateJul 31, 2012
Priority date
Expiry dateJan 15, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D84/856

Abstract

An integrated circuit with a core PMOS transistor formed in a first n-well and an isolated DENMOS (iso-DENMOS) transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same. A method of forming an integrated circuit with a core PMOS transistor formed in a first n-well and an iso-DENMOS transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.