Compensated isolated p-well DENMOS devices
US8232158B2 · kind B2 · utility
5Cited by
0References
9Claims
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Assignee
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Key dates
| Filing date | Jun 28, 2010 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Jan 15, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/856
Abstract
An integrated circuit with a core PMOS transistor formed in a first n-well and an isolated DENMOS (iso-DENMOS) transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same. A method of forming an integrated circuit with a core PMOS transistor formed in a first n-well and an iso-DENMOS transistor formed in a second n-well where the depth and doping of the first and second n-wells are the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.