Metal piperidinate and metal pyridinate precursors for thin film deposition
US8236381B2 · kind B2 · utility
14Cited by
7References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 10, 2009 |
| Grant date | Aug 7, 2012 |
| Priority date | — |
| Expiry date | Oct 20, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and compositions for depositing a film on one or more substrates include providing a reactor and at least one substrate disposed in the reactor. At least one lanthanide precursor is provided in vapor form and a lanthanide metal thin film layer is deposited onto the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.