Lithographic apparatus and calibration method
US8248583B2 · kind B2 · utility
1Cited by
5References
18Claims
0Family size
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Key dates
| Filing date | Feb 6, 2009 |
| Grant date | Aug 21, 2012 |
| Priority date | — |
| Expiry date | Apr 25, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70516
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.