Patent · US Active

Polishing slurry for aluminum and aluminum alloys

US8251777B2 · kind B2 · utility

2Cited by
4References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 11, 2008
Grant dateAug 28, 2012
Priority date
Expiry dateApr 5, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F77/42
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

The invention is directed to a method of polishing a surface of an object that includes aluminum. The method includes the step of contacting the surface of the object with a soft polishing pad and a polishing composition. The polishing composition includes abrasive particles, an agent that oxidizes aluminum, and a liquid carrier to polish the surface of the object. The polishing composition includes the abrasive particles suspended in the liquid carrier, and is applied at a pH above about 7.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.