Apparatus for the efficient coating of substrates including plasma cleaning
US8252375B2 · kind B2 · utility
2Cited by
15References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2005 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Jan 6, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.