Optical imaging writer system
US8253923B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2008 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Feb 13, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70508
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the imaging system includes a plurality of spatial light modulator (SLM) imaging units, where each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro minors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The imaging system further includes a controller configured to control the plurality of SLM imaging units, where the controller tunes each of the SLM imaging unit individually in writing a mask data to a substrate in a lithography manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.