Catoptric illumination system for microlithography tool

US8253925B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jens Ossmann · Aalen, DE
• Martin Endres · Oberkochen, DE
• Ralf Stuetzle · Aalen, DE

Key dates

• Filing date: Jul 31, 2009
• Grant date: Aug 28, 2012
• Expiry date: Dec 23, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70083
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.