Patent · US Active

Device and method for measuring lithography masks

US8253947B2 · kind B2 · utility

0Cited by

5References

17Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Albrecht Hof · Aalen, DE
Günter Maul · Aalen, DE
Dietmar Neugebauer · Pfaffenhofen an der Ilm, DE
Armin Bich · Aalen, DE
Monika Frey · Steinheim, DE
Wolfgang Scherm · Nattheim, DE
Stefan Otto · Dörentrup, DE
Rainer Maul · Hüttlingen, DE
Helmut Krause · Kelkheim, DE

Key dates

Filing date	Nov 6, 2007
Grant date	Aug 28, 2012
Priority date	—
Expiry date	Apr 6, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7096
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A device for measuring lithography masks is provided, comprising

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.