Source-collector module with GIC mirror and xenon liquid EUV LPP target system
US8258485B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2010 |
| Grant date | Sep 4, 2012 |
| Priority date | — |
| Expiry date | Feb 5, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.