Patent · US Active

Method of producing a diffractive optical element and diffractive optical element produced by such a method

US8259392B2 · kind B2 · utility

0Cited by

14References

13Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Harald Volkenandt · Aalen, DE
Gundula Weiss · Aalen, DE

Key dates

Filing date	Feb 13, 2008
Grant date	Sep 4, 2012
Priority date	—
Expiry date	Apr 20, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70566
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithography projection exposure system has an illumination system with an illumination optical system. The latter can have at least one diffractive optical element, which is divided into multiple adjacently arranged individual elements, each of which has one specified bundle-forming and polarizing effect.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.