Patent · US Active

Leveler compounds

US8262891B2 · kind B2 · utility

7Cited by
17References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 2, 2006
Grant dateSep 11, 2012
Priority date
Expiry dateFeb 15, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/423
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.