Inventor · Hudson, MA, US

Deyan Wang

65Patents
7h-index
63Co-inventors
71Inventor score

Filing activity: Jun 4, 2003 → Oct 18, 2021

Most-cited inventions

PatentTitleAreaCited byStatus
US7128822B2 Leveler compounds Chemistry; Metallurgy 31 Expired
US7968268B2 Compositions and processes for immersion lithography Physics 22 Active
US8241832B2 Compositions and processes for photolithography Physics 16 Active
US7662981B2 Leveler compounds Electricity 16 Active
US7510639B2 Leveler compounds Electricity 13 Active
US7776506B2 Coating compositions for photoresists Physics 9 Active
US9562169B2 Metal hardmask compositions Electricity 7 Active
US8262891B2 Leveler compounds Electricity 7 Active
US8257902B2 Compositons and processes for immersion lithography Electricity 6 Active
US9156785B2 Base reactive photoacid generators and photoresists comprising same Physics 6 Active
US8927439B1 Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent Electricity 4 Active
US9102901B2 Methods and compositions for removal of metal hardmasks Electricity 4 Active
US8012666B2 Compositions and processes for photolithography Physics 3 Active
US8795774B2 Hardmask Chemistry; Metallurgy 3 Active
US9012128B2 Photoresist and coated substrate comprising same Chemistry; Metallurgy 3 Active
US8715902B2 Compositions and processes for immersion lithography Physics 3 Active
US8722825B2 Surface active additive and photoresist composition comprising same Chemistry; Metallurgy 3 Active
US9171720B2 Hardmask surface treatment Electricity 3 Active
US9382444B2 Neutral layer polymers, methods of manufacture thereof and articles comprising the same Chemistry; Metallurgy 2 Active
US8506788B2 Leveler compounds Electricity 2 Active
US9868820B2 Polyarylene materials Electricity 2 Active
US9274427B2 Compositions and processes for photolithography Chemistry; Metallurgy 2 Active
US8871428B2 Compositions and processes for immersion lithography Electricity 2 Active
US9563128B2 Compositions and processes for immersion lithography Physics 2 Active
US8883400B2 Compositions and processes for photolithography Physics 2 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.