Method and apparatus for enhancing in-situ gas flow measurement performance
US8265888B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2009 |
| Grant date | Sep 11, 2012 |
| Priority date | — |
| Expiry date | Jan 8, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0324
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.