Annealing of semi-insulating CdZnTe crystals
US8268663B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Jun 2, 2009 |
| Grant date | Sep 18, 2012 |
| Priority date | — |
| Expiry date | Jun 2, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a method of annealing a Cd1-xZnxTe sample/wafer, surface contamination is removed from the sample/wafer and the sample/wafer is then introduced into a chamber. The chamber is evacuated and Hydrogen or Deuterium gas is introduced into the evacuated chamber. The sample/wafer is heated to a suitable annealing temperature in the presence of the Hydrogen or Deuterium gas for a predetermined period of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.