Method of manufacturing optical element, and optical element
US8273506B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2010 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | Jun 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/34
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A manufacturing method of an optical element is provided, the optical element comprising: a shield part formed by a light shielding film formed and patterned on a substrate; a light transmission part formed by partially exposing a surface of the substrate; and a phase shifter part formed by partially etching the surface of the substrate, the method comprising the steps of: preparing an optical element blank with the light shielding film and a first resist film laminated on the substrate in this order; and forming a first resist pattern by applying drawing and development to the first resist film, covering a formation scheduled area of the shield part, and demarcating the formation scheduled area of the phase shifter part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.