Sample processing and observing method
US8274049B2 · kind B2 · utility
3Cited by
17References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2011 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | Mar 17, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There is provided a sample processing and observing method including irradiating a focused ion beam to a sample to form an observed surface, irradiating an electron beam to the observed surface to form an observed image, removing the surface opposite to the observed surface of the sample, forming a lamella including the observed surface and obtaining a transmission observed image for the lamella.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.