Method of erasing a flash EEPROM memory
US8274839B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2011 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | May 15, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C16/16
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for erasing a flash EEPROM memory device is disclosed. The memory device has a first semiconductor region of one conductivity type formed within a second semiconductor region of an opposite conductivity type, source and drain regions formed from a semiconductor layer of the opposite conductivity type in the first semiconductor region, a well electrode formed from a semiconductor layer of the conductivity type inside the first semiconductor region, a charge storing layer electrically isolated from the first semiconductor region by a dielectric layer and having electric charge retention properties, and a control gate electrode electrically isolated from the charge storing layer by a inter layer of coupling dielectrics. The method comprises the steps of: applying a first voltage bias to both the well electrode and the second semiconductor region and a second bias to the control gate electrode for a duration of F/N tunneling; applying a third voltage bias to the well electrode and the second semiconductor region and a first zero voltage bias to the control gate electrode for a duration of traps depopulation; and, after the duration of traps depopulation, applying a fourth volt…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.