Patent · US Active

Salt and photoresist composition containing the same

US8278023B2 · kind B2 · utility

2Cited by
1References
10Claims
0Family size

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Inventors

Key dates

Filing dateMay 25, 2010
Grant dateOct 2, 2012
Priority date—
Expiry dateApr 14, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0392
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt represented by the formula (I-BB):wherein Q1 and Q2 each independently represent a fluorine atom etc.,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.