Structure having substantially parallel resistor material lengths
US8284017B2 · kind B2 · utility
5Cited by
10References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2011 |
| Grant date | Oct 9, 2012 |
| Priority date | — |
| Expiry date | Oct 27, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/30
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A design structure including a pair of substantially parallel resistor material lengths separated by a first dielectric are disclosed. The resistor material lengths have a sub-lithographic dimension and may be spacer shaped.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.