Patent · US Active

Dual-stage switching system for lithographic machine

US8284380B2 · kind B2 · utility

1Cited by

2References

5Claims

0Family size

Assignee

TSINGHUA UNIVERSITY · CN

Inventors

Yu Zhu · Nanjing, CN
Ming Zhang · Beijing, CN
Jinsong Wang · Kawasaki, JP
Guang Li · Beijing, CN
Dengfeng Xu · Beijing, CN
Wensheng Yin · Beijing, CN
Guanghong Duan · Beijing, CN
Kaiming Yang · Beijing, CN

Key dates

Filing date	Mar 14, 2008
Grant date	Oct 9, 2012
Priority date	—
Expiry date	Jun 18, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70733
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A dual-stage switching system for lithographic machine includes a wafer stage to be operated in an exposure station and another wafer stage to be operated in a pre-processing station. The two wafer stages are provided on a base, with four 2-DOF driving units capable of moving along X direction and Y direction being provided along the edge of the base, and the wafer stages being disposed in a space surrounded by the four 2-DOF driving units and suspended on an upper surface of the base by air bearings. Each of the 2-DOF driving units includes upper and lower linear guides and a guiding sleeve, with the upper and lower linear guides being installed vertical to each other in their corresponding guiding sleeve. Two adjacent 2-DOF driving units cooperatively drive the wafer stage) to move in the X direction and Y direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.