Patent · US Active

Debris removal in high aspect structures

US8287653B2 · kind B2 · utility

9Cited by

13References

10Claims

0Family size

Assignee

RAVE LLC · US

Inventors

Tod Evan Robinson · Boynton Beach, US
Bernabe J. Arruza · Boca Raton, US
Kenneth Gilbert Roessler · Boca Raton, US

Key dates

Filing date	Sep 17, 2007
Grant date	Oct 16, 2012
Priority date	—
Expiry date	Aug 15, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70925
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method of debris removal is provided. The method includes positioning a nanometer-scaled tip adjacent to a piece of debris on a substrate. The method also includes adhering the piece of debris to the tip. In addition, the method also includes removing the piece of debris from the substrate by moving the tip away from the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.