Methods and compositions for forming aperiodic patterned copolymer films
US8287957B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 22, 2005 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Aug 14, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. The invention also provides compositions containing a substrate pattern with irregular features replicated in a block copolymer material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.