Paul Franklin Nealey
31Patents
11h-index
58Co-inventors
78Inventor score
Filing activity: Nov 2, 1999 → Mar 8, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6527964B1 | Methods and apparatuses for improved flow in performing fluidic self assembly | Electricity | 227 | Expired |
| US6926953B2 | Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates | Emerging Cross-Sectional Technologies | 148 | Expired |
| US6746825B2 | Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates | Emerging Cross-Sectional Technologies | 137 | Expired |
| US7141176B1 | Methods and apparatuses for assembling elements onto a substrate | Electricity | 72 | Expired |
| US7326514B2 | Organoelement resists for EUV lithography and methods of making the same | Emerging Cross-Sectional Technologies | 46 | Expired |
| US8133534B2 | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials | Emerging Cross-Sectional Technologies | 32 | Active |
| US8133341B2 | Molecular transfer printing using block copolymers | Performing Operations; Transporting | 29 | Active |
| US8168284B2 | Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates | Emerging Cross-Sectional Technologies | 22 | Active |
| US8287957B2 | Methods and compositions for forming aperiodic patterned copolymer films | Performing Operations; Transporting | 18 | Active |
| US8501304B2 | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials | Emerging Cross-Sectional Technologies | 16 | Active |
| US7851252B2 | Materials and methods for creating imaging layers | Electricity | 15 | Active |
| US8618221B2 | Directed assembly of triblock copolymers | Emerging Cross-Sectional Technologies | 11 | Active |
| US8623493B2 | Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates | Emerging Cross-Sectional Technologies | 11 | Active |
| US9183870B2 | Density multiplication and improved lithography by directed block copolymer assembly | Performing Operations; Transporting | 8 | Active |
| US9299381B2 | Solvent annealing block copolymers on patterned substrates | Emerging Cross-Sectional Technologies | 5 | Active |
| US9372398B2 | Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers | Emerging Cross-Sectional Technologies | 3 | Active |
| US7514764B2 | Materials and methods for creating imaging layers | Electricity | 3 | Active |
| US7807348B2 | Optical imaging of nanostructured substrates | Physics | 3 | Expired |
| US9927706B2 | Atomic layer chemical patterns for block copolymer assembly | Electricity | 2 | Active |
| US9718250B2 | Directed assembly of block copolymer films between a chemically patterned surface and a second surface | Emerging Cross-Sectional Technologies | 1 | Active |
| US10755942B2 | Method of forming topcoat for patterning | Electricity | 1 | Active |
| US10969642B2 | Blue phases on patterned surfaces | Physics | 1 | Active |
| US9539788B2 | Fabrication of complex three-dimensional structures based on directed assembly of self-assembling materials on activated two-dimensional templates | Emerging Cross-Sectional Technologies | 1 | Active |
| US9914847B2 | Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure | Chemistry; Metallurgy | 0 | Active |
| US10438626B2 | Density multiplication and improved lithography by directed block copolymer assembly | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.