Chemically amplified resist composition and pattern forming process
US8288076B2 · kind B2 · utility
9Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 2010 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Jan 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A chemically amplified resist composition comprises a polymer comprising units having polarity to impart adhesion and acid labile units adapted to turn alkali soluble under the action of acid. The polymer comprises recurring units having formula (1) wherein R1 is H, F, CH3 or CF3, Rf is H, F, CF3 or CF2CF3, A is a divalent hydrocarbon group, R2, R3 and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl. Recurring units containing an aromatic ring structure are present in an amount ≧60 mol % and the recurring units having formula (1) are present in an amount <5 mol %.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.