Method of forming noble metal layer using ozone reaction gas
US8288274B2 · kind B2 · utility
3Cited by
5References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2008 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Aug 27, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B53/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A noble metal layer is formed using ozone (O3) as a reaction gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.