Method for production of substrate electrode for plasma processing
US8291581B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | May 30, 2008 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Jun 26, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49165
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plurality of reference holes are formed in the surface of a first substrate made of a first material, and a plurality of columnar members are each fitted in the reference holes in such a manner that at least a part of each of the columnar members projects from the surface of the first substrate. Subsequently, an electrode surface layer made of a second material is formed on the surface of the first substrate in such a manner that an end portion of each of the columnar members are exposed at the surface and then the columnar members are removed. Thus obtained is a substrate-like electrode including at least an electrode surface layer provided with through holes having a cross section matching a sectional shape of the projecting portion of the columnar members.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.