Gas heating device for a vapor deposition system
US8291856B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 2008 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Aug 24, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4557
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and system for depositing a thin film on a substrate using a vapor deposition process is described. The processing system comprises a gas heating device for heating one or more constituents of a film forming composition. The gas heating device comprises one or more resistive heating elements configured to receive an electrical current from one or more power sources. Additionally, the gas heating device comprises a mounting structure configured to support the one or more resistive heating elements. Furthermore, the gas heating device comprises one or more static mounting devices coupled to the mounting structure and configured to fixedly couple the one or more resistive heating elements to the mounting structure, and one or more dynamic mounting devices coupled to the mounting structure and configured to automatically compensate for changes in a length of each of the one or more resistive heating elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.