Hybrid integrated circuit device
US8293547B2 · kind B2 · utility
3Cited by
20References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2011 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Mar 29, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/37001
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An embodiment of a method to form a hybrid integrated circuit device is described. This embodiment of the method comprises: forming a first die using a first lithography, where the first die is on a substrate; and forming a second die using a second lithography, where the second die is on the first die. The first lithography used to form the first die is a larger lithography than the second lithography used to form the second die. The first die is an IO die.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.