Patent · US Active

Hybrid integrated circuit device

US8293547B2 · kind B2 · utility

3Cited by
20References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 2, 2011
Grant dateOct 23, 2012
Priority date
Expiry dateMar 29, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/37001
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An embodiment of a method to form a hybrid integrated circuit device is described. This embodiment of the method comprises: forming a first die using a first lithography, where the first die is on a substrate; and forming a second die using a second lithography, where the second die is on the first die. The first lithography used to form the first die is a larger lithography than the second lithography used to form the second die. The first die is an IO die.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.