Patent · US Active

Linear electron source, evaporator using linear electron source, and applications of electron sources

US8294115B2 · kind B2 · utility

0Cited by

8References

23Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Guenter Klemm · Nidda, DE
Volker Hacker · Schongau, DE
Hans-Georg Lotz · Grundau, DE

Key dates

Filing date	Nov 17, 2008
Grant date	Oct 23, 2012
Priority date	—
Expiry date	Mar 25, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3053
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.