Gas inlet element for a CVD reactor

US8298337B2 · kind B2 · utility

Assignee

• Aixtron, Inc. · DE

Inventors

• Markus Reinhold · Aachen, DE
• Peter Baumann · Tirschenreuth, DE
• Gerhard Karl Strauch · Wiesbaden, DE

Key dates

• Filing date: Jan 5, 2006
• Grant date: Oct 30, 2012
• Expiry date: Jan 7, 2029

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45512
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement.