Charged particle beam system
US8304725B2 · kind B2 · utility
111Cited by
6References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 11, 2010 |
| Grant date | Nov 6, 2012 |
| Priority date | — |
| Expiry date | Jan 11, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2803
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam system wherein the output of the secondary electron detector is detected while the retarding voltage is varied between the values for which the secondary electrons do not reach the sample and the values for which the secondary electrons reach the sample, and the surface potential of the sample is determined on the basis of the relationship between the retarding voltage and the detected output of the secondary electron detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.