Deep ultraviolet light emitting device and method for fabricating same
US8304756B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 17, 2007 |
| Grant date | Nov 6, 2012 |
| Priority date | — |
| Expiry date | May 17, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/819
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An ultra-violet emitting light-emitting device and method for fabricating an ultraviolet light emitting device (LED) with an AlInGaN multiple-quantum-well active region exhibiting stable cw-powers. The LED includes a template with an ultraviolet light-emitting structure on it. The template includes a first buffer layer on a substrate, then a second buffer layer on the first preferably with a strain-relieving layer in both buffer layers. Next there is a semiconductor layer having a first type of conductivity followed by a layer providing a quantum-well region with an emission spectrum ranging from 190 nm to 369 nm. Another semiconductor layer having a second type of conductivity is applied next. Two metal contacts are applied to this construction, one to the semiconductor layer having the first type of conductivity and the other to the semiconductor layer having the second type of conductivity, to complete the LED.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.