Lithographic apparatus, method and device manufacturing method
US8310651B2 · kind B2 · utility
1Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2009 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Aug 7, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70833
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.